Optical properties of Ni from 0.03 to 6 eV

2014 The complex dielectric function of Ni thin films deposited on fused silica and crystalline germanium substrates by thermal evaporation under ultra-high vacuum is deduced from optical measurements by various methods : from 6 to 0.5 eV from reflectance and transmittance measurements ; from 0.5 to 0.09 eV by a method based on A.T.R. and surface plasmon excitation; from 0.2 to 0.03 eV by a Kramers-Kronig analysis performed on the reflectivity. The onset of interband transitions is thus determined and the Drude parameters of the conduction electrons are calculated The results are discussed in relation to the characteristics of the films (thickness, annealing, resistivity, crystallites size) and eventually interpreted using band structure calculations. J. Physique 47 (1986) 1405-1410 AOUT 1986,